TOPIC: Advances in Metrology
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1:30 p.m. Vidumin Dahanayake, Anton Paar, Zeta potential as an indicator of solid surface chemical properties
2:00 p.m. Sung Park, Molecular Vista, Molecular Analysis of Nanoscale Defects and Residue
2:30 p.m. Steven W. Meeks, Lumina Instruments, Contamination on Transparent and Opaque Materials
3:00 p.m. Dan Sullivan, EAG Laboratories, Surface contaminant analysis by TOF-SIMS and SEM/EDX