2023/10/26 09:00:00
A panel of renowned experts will discuss the state of art in plasma processing including high and low pressure processing limitations, advanced plasma excitation and reactor control, and tools and requirements for the fabrication of leading edge devices. Further topics include plasma-assisted deposition and etching of advanced films and new materials, plasmas for atomic layer deposition and etching, very fine line plasma etching and deposition, fundamental limits of plasma processing, and new and evolving applications.
Richard A. Gottscho, Executive Vice President, Lam Research Corporation, USA
Vincent M. Donnelly, Professor, Dept. of Chemical and Biomolecular Engineering, University of Houston, USA
W.M.M. (Erwin) Kessels, Professor, Dept. of Applied Physics, Eindhoven University of Technology, The Netherlands
Jianping Zhao, Technical Director, Tokyo Electron, USA
All presentations from the PAG meeting will be posted on the PAG Users Group Proceedings webpage ~2 weeks following the meeting.
CO-CHAIRS:
Daphne Pappas, Director of R&D, Plasmatreat USA
Daniel L. Flamm, CEO Microtechnology Law & Analysis
Sponsorship
If you would like to sponsor a 2023 or 2024* User Group (CMPUG, JTG, PAG, or TFUG) meeting please check out opportunities at:
NCCAVS User Groups Marketing Opportunities
*2024 Schedule is TBD