Junction Technology User Group Meeting:
Date, Location & Registration:
July 13, 2018
1:00 – 5:00 p.m.
810 Kifer Road
FREE TO ATTEND–Just Show Up!
Session 1: Technology
“High Performance High Temperature Ion Implanter (IMPHEAT) for Manufacturing SiC Power Devices”, Naoya Takahashi, Nissin Ion Equipment
“Dual Beam nSec Annealing for MOL & BEOL Applications”, Shaoyin Chen, Ultratech/Veeco
“A New Technology (ALProTM) for Depth Profiling of Electrical Properties at Atomic-Level Resolution“, Abhijeet Joshi, Active Layer Parametrics
BREAK: Cookies and Conversation
Session 2: Tutorials
“A quick look at 14-nm and 10-nm devices”, Dick James, Siliconics
“Atomic Level Material and Device Analysis for FinFET and Nanowire Design”, Victor Moroz, Synopsys
All presentations will be requested to be posted on the JTG Proceedings webpage approximately 1-2 weeks following the meeting.