CMP User Group Meeting:
CALL FOR PAPERS:
Date, Location & Registration:
April 12, 2018
1:00 – 6:00 p.m.
Nanofab South Auditorium
SUNY Polytechnic Institute/CNSE
University of Albany
255 Fuller Road
Albany, NY 12203
PARKING: FREE! Follow the event parking sign (to be posted by security prior to the event)
Abstracts are now being accepted for the Chemical Mechanical Planarization Users Group (CMPUG) April 12, 2018 Symposium on Advances in CMP Consumables, Materials, and Tools. The symposium will provide an international forum for academic researchers, industrial practitioners and engineers from around the world for the exchange of information on state-of-the-art research in CMP semiconductor technology. The CMPUG promotes the exchange of opportunities, ideas, friendly relationships and research collaboration. The areas of focus for this meeting will be the following:
- CMP Consumables and Materials
- CMP Polishing and Metrology Tools
- CMP Process Integration
Authors will be notified of acceptance by return e-mail.
All accepted presenters are required to submit their presentations in pdf or ppt format, approved by their respective organizations/employers for public release, by April 9, 2018.
All presentations will be posted on the CMPUG Proceedings webpage and will be live via webcast.
FREE ONLINE REGISTRATION:
NEED TO REGISTER IN ADVANCE FOR SECURITY APPROVAL!
If you would like to sponsor a user group meeting please check out the
NCCAVS User Groups Marketing Opportunities